Vacío plata chapado alta velocidad acero como base material

M2 high-speed steel is selected as the base material, the sample size is 6mm × 6mm × 10mm, and several taps of the same material with the specification of Φ10mm are prepared for the cutting test. The sputtering target materials are one pair of titanium metal target (purity 99.99 percent ) and graphite target (purity 99.99 percent ), and the two kinds of targets (4 targets) are alternately and evenly arranged on the inner wall of the coating chamber. Before coating, the surface of the sample was ground to remove macroscopic scratches visible to the naked eye, and polished to a mirror surface. Then, the tap and the sample were sandblasted to remove the contamination of the superficial layer. After ultrasonic cleaning, it was dried and installed in the furnace. Evacuate to 9.0×10-3Pa, preheat the workpiece for 60min, and then use the effect of argon ion bombardment to etch and clean the substrate under negative bias for 30min. In order to improve the bonding strength between the thin film and the substrate, a Ti metal transition layer is deposited on the substrate by the Ti metal block in the evaporation crucible. Finally, under the condition of pressure of 4.5×10-1Pa, TiCN thin films were prepared by co-sputtering graphite target and titanium target for 3h. Cool for 1h after coating, and take out the sample.

Mixto atmósfera de nitrógeno y argón para vacío plata chapado'

En cambio de CH4 o C2H2, TiCN films were prepared by co-sputtering graphite targets and titanium targets in a mixed atmosphere of nitrogen and argon, and the composition, structure, hardness and bonding strength of the TiCN films obtenido under this preparation method were analyzed and analyzed. At the same time, the practical application of TiCN films deposited on the surface of high-speed steel taps by this method was investigado.

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